说明
HTO(B TYPE)配置
无配置OEM 型号描述
TELINDY PLUS™ is a cutting-edge thermal processing technology that combines the best features of the TELFORMULA™ minibatch system and the previous generation TELINDY™ platform. It offers improved process performance and productivity, with new enhancements such as improved maintenance access, dry gas chamber cleaning, and low O2 environment loading area control. These features contribute to yield increases by managing small particles more effectively. The highest levels of productivity are achieved by combining a 125 wafer load size with TEL’s FTPS™ responsive heater and a dual boat system option. TELINDY PLUS™ can be used for a wide range of applications, from traditional silicon treatments to leading edge ALD processes and radical oxidation. It represents the convergence of demonstrated experience and advanced technology, making it a powerful tool for thermal processing.文件
无文件
类别
Furnaces / Diffusion
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
127682
晶圆尺寸：
12"/300mm
年份：
2018
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
TELINDY PLUS
类别
Furnaces / Diffusion
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
127682
晶圆尺寸：
12"/300mm
年份：
2018
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
HTO(B TYPE)配置
无配置OEM 型号描述
TELINDY PLUS™ is a cutting-edge thermal processing technology that combines the best features of the TELFORMULA™ minibatch system and the previous generation TELINDY™ platform. It offers improved process performance and productivity, with new enhancements such as improved maintenance access, dry gas chamber cleaning, and low O2 environment loading area control. These features contribute to yield increases by managing small particles more effectively. The highest levels of productivity are achieved by combining a 125 wafer load size with TEL’s FTPS™ responsive heater and a dual boat system option. TELINDY PLUS™ can be used for a wide range of applications, from traditional silicon treatments to leading edge ALD processes and radical oxidation. It represents the convergence of demonstrated experience and advanced technology, making it a powerful tool for thermal processing.文件
无文件