说明
无说明配置
Gas module: N2, Ar, BF3, Ar (Walkup Only) Gas box without gas bottle Source area: Dual vaporizer Accelerator: 0.75 Mev column / Remote control for Ar stripper gas Beam filter: 10° Analysis power / 10° Chamber normal Injector: 60 keV Extraction possibility to 50 keV 110° Analysis power supply Process chamber: (9) Site disks (2) Gate valves for cryo pump, 12" Linear actuator assy for tilt scan transducer Wafer handler: (2) Loadlocks Dump loadlock for 6", 8" cast platform RPM: (3) iQDP80 Dry pump for source, ACCEL, chamber iQDP40 Dry pump Missing parts: 1000C Turbo for source (2) 1000 Turbo for ACCEL (2) Cryo pumps, 12" / 8500 Compressor.OEM 型号描述
The Kestrel 750 is a high energy ion implanter that is the industry’s most cost-effective MeV implanter. It operates in the range of 10 - 3750 keV. Varian offers device makers the lowest cost, most practical MeV production solution with its Kestrel high energy implanter. Kestrel has distinct advantages in cost of ownership with its compact design, unique DC Tandetron accelerator, and large implant chamber. The simplicity of the Kestrel design sets this system apart from other MeV implanters and makes it the tool of choice for production MeV implants.文件
无文件
APPLIED MATERIALS (AMAT) / VARIAN
KESTREL 750
已验证
类别
High Energy
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
24051
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT) / VARIAN
KESTREL 750
已验证
类别
High Energy
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
24051
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Gas module: N2, Ar, BF3, Ar (Walkup Only) Gas box without gas bottle Source area: Dual vaporizer Accelerator: 0.75 Mev column / Remote control for Ar stripper gas Beam filter: 10° Analysis power / 10° Chamber normal Injector: 60 keV Extraction possibility to 50 keV 110° Analysis power supply Process chamber: (9) Site disks (2) Gate valves for cryo pump, 12" Linear actuator assy for tilt scan transducer Wafer handler: (2) Loadlocks Dump loadlock for 6", 8" cast platform RPM: (3) iQDP80 Dry pump for source, ACCEL, chamber iQDP40 Dry pump Missing parts: 1000C Turbo for source (2) 1000 Turbo for ACCEL (2) Cryo pumps, 12" / 8500 Compressor.OEM 型号描述
The Kestrel 750 is a high energy ion implanter that is the industry’s most cost-effective MeV implanter. It operates in the range of 10 - 3750 keV. Varian offers device makers the lowest cost, most practical MeV production solution with its Kestrel high energy implanter. Kestrel has distinct advantages in cost of ownership with its compact design, unique DC Tandetron accelerator, and large implant chamber. The simplicity of the Kestrel design sets this system apart from other MeV implanters and makes it the tool of choice for production MeV implants.文件
无文件
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查看全部无类似上架物品