概述

QualiSurf QSF-500 is designed to accurately measure ppm levels of Silica in hot Phosphoric Acid solutions. This online system provides fast results and interfaces seamlessly with Nitride Wet Etch stations. With self-calibration and auto-verification capabilities, the absolute accuracy of the analysis is ensured, down to the 10ppm range. QSF-500 is the only tool on the market offering automatic, continuous measurement of Silica in Hot Phosphoric Nitride Etchant.