概述

ATC-1800-IM-R utilizing a 14cm, gridded, RF ion source for uniform, reactive milling of a 100mm Ø substrate and features a 2000 l/s turbopump, computer control, retractable faraday cup, load-lock with sputter gun for passivation layers, and a substrate holder with motorized tilting, heating/cooling (5-200°C). This tool is also compatible with Cl gas and includes a (4) MFC hazardous gas box.