Cymer's first prototype KrF laser for lithography.
The first generation excimer laser (CX‐2LS) for lithography operated at 200 Hz and 3 W, with a spectral bandwidth of 3 pm and a wavelength stability of ±0.5 pm. 

ASML Holding NV (ASML) and Cymer, Inc. announced that they have completed the previously announced merger pursuant to which ASML has acquired Cymer.

Cymer, an ASML company, is an industry leader in developing lithography light sources, used by chipmakers worldwide to pattern advanced semiconductor chips. Cymer's light sources, and ongoing innovations, are available to all semiconductor companies to enable advanced device manufacturing today and into the future. Cymer is pioneering the industry's transition to EUV lithography, the next viable step on the technology roadmap for the creation of smaller, faster and more energy-efficient chips. 

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CX-2LS

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