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市场 > Laser > ASML / CYMER > XLR 500i

XLR 500i

类别
Laser
概述

Advancing DUV lithography further, the XLR 500i is the world’s first ArF light source for 45nm immersion production. Based on the dual chamber MOPA platform, XLR introduces Cymer Recirculating Ring Technology, a process that extends the life of the chambers.

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