The NanoLith 7000 is an ArF laser system designed for 193-nm lithography tools. It operates at an impressive 4-kilohertz repetition rate, setting new standards for high-speed scanners in volume production fabs. The NanoLith 7000 boasts enhanced thermal management and optimized gas flow for 20-watt average output power at 100% duty cycle. It enables full, high-contrast imaging for 200-mm and 300-mm lithography steppers with >0.75 NA lenses, revolutionizing high-speed scanners in volume production fabs.

ASML Holding NV (ASML) and Cymer, Inc. announced that they have completed the previously announced merger pursuant to which ASML has acquired Cymer.

Cymer, an ASML company, is an industry leader in developing lithography light sources, used by chipmakers worldwide to pattern advanced semiconductor chips. Cymer's light sources, and ongoing innovations, are available to all semiconductor companies to enable advanced device manufacturing today and into the future. Cymer is pioneering the industry's transition to EUV lithography, the next viable step on the technology roadmap for the creation of smaller, faster and more energy-efficient chips. 

NanoLith 7000

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