概述

The Polaris 2000 Cluster is a next-generation system introduced by the Microlithography division of FSI near the close of fiscal 1994. The system boasts higher throughput and enhanced productivity, with a new high capacity feature that allows the robotic handler to move horizontally within the cluster and access more modules. The Polaris 2000 Cluster tool is positioned in both the high throughput manufacturing arena and the leading edge high-resolution technology area, making it attractive for customers who require “mix and match” capability in their manufacturing lines.