In February 2010, KLA launched PROLITH X3.1, which enables researchers at leading-edge chipmakers, consortia and equipment makers to quickly and costeffectively troubleshoot challenging issues in EUV and double patterning lithography (DPL) processes.

KLA inhabits two worlds: one that’s nanometers in scale and one that’s global. This micro and macro view gives us a unique perspective. We see electrons wave and industries transform. When you put deep science together with optimism, big things happen.

Our process-control and process-enabling solutions are designed to boost the innovation speed of the electronics industry. We help our customers achieve leading-edge performance.

PROLITH X3.1

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