PROLITH X4.1 and PROLITH X4.2, which enable large-scale lithography simulations to troubleshoot challenging issues in extreme ultra-violet (“EUV”), multi-patterning and other advanced optical lithography technologies.

KLA inhabits two worlds: one that’s nanometers in scale and one that’s global. This micro and macro view gives us a unique perspective. We see electrons wave and industries transform. When you put deep science together with optimism, big things happen.

Our process-control and process-enabling solutions are designed to boost the innovation speed of the electronics industry. We help our customers achieve leading-edge performance.

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PROLITH X4.1

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