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市场 > Lithography > NIKON > FX-73S

FX-73S

概述

Resolution (L/S) (switchable): 3.5 µm (g+h+i-line), 3 µm (i-line) (option) Projection magnification: 1:1 Overlay: ≦ 0.6 µm Maximum plate size: 2,200 × 2,500 mm Takt time: 72 sec./plate Conditions: 4 scans, g+h+i-line, 30 mJ/cm2

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