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市场 > Lithography > NIKON > FX-75S

FX-75S

概述

Resolution (L/S): 3.5 µm (g+h+i-line) Projection magnification: 1:1 Overlay: ≦ ±0.6 µm Maximum plate size: 1,950 mm × 2,250 mm Takt time: 58 sec./plate Conditions: 4 scans, g+h+i-line, 30 mJ/cm2

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