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市场 > Lithography > RAITH > EBPG5150

EBPG5150

概述

Tailored for all direct-write applications, the EBPG5150 is specifically optimized for a 155 mm by 155 mm stage, utilizing the universal plinth platform shared with the EBPG5200. Its versatile design allows for loading different sample sizes and quantities, accommodating anything from individual piece parts to full wafer sizes with ease.

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