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6" Fab For Sale from Moov - Click Here to Learn More
6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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VISTEC SB254
    说明
    E-beam Lithography
    配置
    • 50 keV beam energy LaB6 gun • High-precision stage featuring a traverse range of 210mm X 210mm • Lambda/1024 (0.6nm) laser interferometer resolution for position measurement • Fully automated Outer Handling System (OHS) to perform Pod-to-Pod (SMIF) substrate handling including pre-alignment of substrates • OHS is equipped with two (2) loadports for up to 150mm wafers, interfaced to an ISO class 4 mini environment which can be prepared for CAR on request (amine filter) • OHS has storage capacity of up to 10 holders (holder library) • Four (4) titanium wafer holders for 10mm wafers equipped with ESC (two holders for GaAs and GaN each, due to different wafer thickness and Four titanium holders for 150mm equipped with ESC (two holders for GaAs and GaN each, due to different wafer thickness. • OHS to allow automated wafer handling directly from customer wafer carriers via SMIF pods. • High speed variable shape beam and vector scan writing principle • High throughput "write-on-the-fly" working principle • Multi-pass writing • Minimum writing address grid: 1nm • Pattern data storage capacity by a RAID system of 2 Tbyte • Sbvis: visualization software for pattern data formats • Mark Detection Software Package (MDSP) including Image Field Metric
    OEM 型号描述
    未提供
    文件

    VISTEC

    SB254

    verified-listing-icon

    已验证

    类别
    Lithography

    上次验证: 30 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    116457


    晶圆尺寸:

    6"/150mm


    年份:

    2020


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    VISTEC SB254

    VISTEC

    SB254

    Lithography
    年份: 2020状况: 二手
    上次验证30 多天前

    VISTEC

    SB254

    verified-listing-icon
    已验证
    类别
    Lithography
    上次验证: 30 多天前
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    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    116457


    晶圆尺寸:

    6"/150mm


    年份:

    2020


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    E-beam Lithography
    配置
    • 50 keV beam energy LaB6 gun • High-precision stage featuring a traverse range of 210mm X 210mm • Lambda/1024 (0.6nm) laser interferometer resolution for position measurement • Fully automated Outer Handling System (OHS) to perform Pod-to-Pod (SMIF) substrate handling including pre-alignment of substrates • OHS is equipped with two (2) loadports for up to 150mm wafers, interfaced to an ISO class 4 mini environment which can be prepared for CAR on request (amine filter) • OHS has storage capacity of up to 10 holders (holder library) • Four (4) titanium wafer holders for 10mm wafers equipped with ESC (two holders for GaAs and GaN each, due to different wafer thickness and Four titanium holders for 150mm equipped with ESC (two holders for GaAs and GaN each, due to different wafer thickness. • OHS to allow automated wafer handling directly from customer wafer carriers via SMIF pods. • High speed variable shape beam and vector scan writing principle • High throughput "write-on-the-fly" working principle • Multi-pass writing • Minimum writing address grid: 1nm • Pattern data storage capacity by a RAID system of 2 Tbyte • Sbvis: visualization software for pattern data formats • Mark Detection Software Package (MDSP) including Image Field Metric
    OEM 型号描述
    未提供
    文件
    类似上架物品
    查看全部
    VISTEC SB254

    VISTEC

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    Lithography年份: 2020状况: 二手上次验证:30 多天前
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    Lithography年份: 2014状况: 二手上次验证:30 多天前
    VISTEC SB254

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    Lithography年份: 0状况: 二手上次验证:22 天前