Designs, manufactures and services ion implantation and other processing equipment used in the fabrication of semiconductor chips.

AXCELIS

OPTIMA MDxt

ORion NV-6072, for low-temperature polysilicon TFT-LCD.

In 2000, Eaton spun off Axcelis as a separate company, and Axcelis inherited Eaton’s 50-percent ownership stake in the joint venture. SEN, licenses technology from Axcelis for ion implantation, has exclusive rights to the territory of Japan and is the leading producer of ion implantation equipment in Japan. In 2009, the merger between Axcelis Technologies and Sumitomo Heavy Industries dissolved—Sumitomo became the sole parent company, and with this, the company name changed to SEN Corporation. 

SEN CORPORATION / SUMITOMO

ORion NV 6072

"Designed for the 300mm market, Quantum is an advanced ion implanter series that utilizes the differential lens technology of the xRLEAP system. It offers enhanced beam optics, resulting in improved low-energy productivity compared to the xRLEAP system. With high beam currents and fast auto-tune capability, Quantum is the industry's most effective ion implanter for applications at 130nm and below. Its new energy control technology ensures excellent energy accuracy and enables ultra-low energy implants with remarkable precision of ±7.5 volts. The This system provides conductive doping for multiple device generations, offering a small-footprint platform for both 200mm and 300mm wafer sizes. The Quantum series excels at low-energy implantation while delivering excellent performance in mid-energy implants (10-80keV). With high current levels, it achieves high production throughput and lower cost of ownership. The market-leading Quantum LEAP system has gained rapid acceptance among chipmakers worldwide for its ability to form ultra-shallow junctions, enabling smaller transistors and higher device speeds.
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Applied Materials is committed to accelerating this new PPACt playbook for our customers and partners. We have the broadest and deepest portfolio of products for delivering PPACt innovations to the market. This portfolio encompasses the ability to create and deposit, shape and remove, modify, analyze, and connect materials and devices in new ways. We are unique in having a broad suite of process technology and metrology capabilities under one roof, and we have highly differentiated silicon and packaging lab capabilities. Our Integrated Materials Solutions co-optimize materials deposition, removal, modification, and analysis to create new materials and engineer new structures for high-performance, low-power chips at leading-edge nodes.

APPLIED MATERIALS (AMAT)

QUANTUM LEAP III

The xR LEAP is the industry’s first sub-keV ion implanter that utilizes patented differential lens technology to achieve beam currents as low as 200eV. This paves the way for ultra-shallow junction development required in advanced 0.18µm and 0.13µm devices. The enhancements built into the xRS Series implanters result in higher throughput, with 235 wafers per hour for 200mm and 220 wafers per hour for 300mm, and lower cost of ownership.

Low Energy

概述

服务

Low Energy 的制造商

Low Energy 的热门产品

OPTIMA MDxt

ORion NV 6072

QUANTUM LEAP III

xR LEAP