说明
Applied Materials Centura SiNgenPlus Low Pressure Chemical Vapor Deposition Furnace配置
3 chambers SiNgen, 2 orienter/ EMP cool downThermal NitrideOEM 型号描述
Silicon Nitride Deposition - Applied offers a single-wafer, high-temperature system to deposit silicon nitride films, called the SiNgen™ Centura. This system operates at a lower deposition temperature than conventional methods to minimize the amount of time the wafer is exposed to high temperatures and to reduce particles while improving many areas of operating cost and productivity in critical transistor nitride layers for sub-0.18 micron devices.文件
无文件
APPLIED MATERIALS (AMAT)
CENTURA SINGEN
已验证
类别
LPCVD Poly
上次验证： 30 多天前
物品主要详细信息
状况：
Parts Tool
运行状况:
未知
产品编号：
93181
晶圆尺寸：
未知
年份：
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA SINGEN
类别
LPCVD Poly
上次验证： 30 多天前
物品主要详细信息
状况：
Parts Tool
运行状况:
未知
产品编号：
93181
晶圆尺寸：
未知
年份：
2000
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Applied Materials Centura SiNgenPlus Low Pressure Chemical Vapor Deposition Furnace配置
3 chambers SiNgen, 2 orienter/ EMP cool downThermal NitrideOEM 型号描述
Silicon Nitride Deposition - Applied offers a single-wafer, high-temperature system to deposit silicon nitride films, called the SiNgen™ Centura. This system operates at a lower deposition temperature than conventional methods to minimize the amount of time the wafer is exposed to high temperatures and to reduce particles while improving many areas of operating cost and productivity in critical transistor nitride layers for sub-0.18 micron devices.文件
无文件