Canon Inc. is the world’s largest camera manufacturer with a history spanning over 80 years, during which time they have made some of the most important innovations within both photographic and video technology.

CANON

PLA-501F

The Canon MPA-600FA is a high-throughput mirror projection mask aligner delivers stable performance ideal for VLSI chip production, boasting a 1.5um resolution and +/- 6um depth-of-focus across the entire field for 4”, 5”, and 6” wafers. With field-proven auto alignment via laser scanning, target placement in scribe lines, and seamless compatibility for mix-and-match with steppers, it's a top-tier solution for precision alignments.

MPA-600FA

PLA 501

PLA-501FA

PLA-600FA

PLA-600F

The Canon MPA-600Super is a 1:1 mirror projection mask aligner that features improved overlay accuracy for mass production of VLSI devices. It was developed based on the MPA-600FA and MPA-500FAb and achieves better yield, higher throughput, and improved stability. It can handle wafer sizes ranging from 4 to 6 inches and mask sizes from 5 to 7 inches.

MPA-600SUPER

The Canon MPA-600 FA is a one-to-one projection aligner for 6" wafers. It uses a high intensity Mercury lamp to expose the wafer through a mask plate and a series of mirrors. The wafer scans horizontally through an arc of light at a specified scan speed to expose the light-sensitive positive photoresist that was coated onto the wafer. The Canon MPA-600 FA has a wafer size of 5 or 6 inches and a mask size of 6 or 7 inches square. It uses a projection mirror with a magnification of 1X and an illuminator that is a 2kW super high pressure mercury lamp. The exposure wavelengths used are 365 nm (i-line), 405 nm (h-line), and 436 nm (g-line). The resolution is 2.5 um over the entire 6 inch surface and the depth of focus is more than +/- 6 um at linewidth 1.5 um. The alignment accuracy is 3 sigma, < or = 0.6 um.

CANON

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热门 CANON Mask Aligner

PLA-501F

MPA-600FA

PLA 501

PLA-501FA

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