概述

The XS-1 Sirius uses a newly designed optical observation system that uses a wide-field lens and a high resolution CMOS camera to achieve a wide area of ​​approximately 12 times the area of ​​one-shot observation (compared to the previous model XS-1). It is possible to observe the Furthermore, by adopting a newly designed optical fiber cable, it is possible to observe with a higher SN than conventional models, and in addition to achieving improved visibility of dislocations, a viewer and tiling (image stitching) developed by our company By applying software, stress-free observation of the entire surface of the wafer is realized.