Platform for actinic EUV measurements provides full emulation
Provides full emulation of the scanner imaging conditions for the NXE:3xy0 scanner systems, with extension capability to next generation EXE:5000 high-NA scanner systems. With its high precision stage for defect location accuracy and the employment of an EUV plasma source, AIMS EUV meets the industry production requirements for manufacturing defect-free EUV photomasks.

ZEISS is the global technology leader in the production of systems and modules for microchip production. With semiconductor manufacturing optics, photomask systems and process control solutions, ZEISS supplies key technologies for the production of ultra-fine conductor track structures on silicon wafers – the raw material used to make microchips. Advances in computer technology largely rely on the ongoing development of optical lithography – every new generation enables even finer structures to be produced on the microchips. This makes circuits more compact, resulting in more powerful and more energy-efficient microchips every year. ZEISS has been driving the development of semiconductor manufacturing technology right from day one. ZEISS’ new and unique extreme ultraviolet (EUV) lithography has created a series of further generations of microchips with ever greater integration density and performance.

AIMS EUV

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