概述

The mask aligner UV-KUB 3 is the first mask alignment system equipped with a UV-LED light source, that provide an unrivalled collimation and homogeneous exposure, on the international market. Compact, easy to use and efficient, the mask alignment system UV-KUB 3 allows alignment up to 7" photolithography mask with substrates up to 6" in a cube volume of 48cm size.