The E500-EHP is a medium current ion implanter made by AMAT (Varian). It processes one or two cassettes of wafers as a batch, a single wafer at a time.

November 10, 2011 – Applied Materials, Inc. announced the successful completion of its acquisition of Varian Semiconductor Equipment Associates, Inc. 
Varian is the leading supplier of ion implantation equipment used by chip makers and has been applying this technology to crystalline silicon wafers for photovoltaic panels. Varian will operate as a business unit of Applied's Silicon Systems Group.

APPLIED MATERIALS (AMAT) / VARIAN

E500-EHP

The Varian 350D is a medium current ion implanter that is capable of implanting Boron (B11 or BF2) or Phosphorous (P31) in 4” or 6” wafers with doses of 1E12 to 5E15. Implant energy levels can be adjusted from 10KeV and 200 KeV1. It is set up for 100mm and 150mm round substrates. It has applications in power devices, memory, logic, analog, discrete and MEMS.

350D

The Varian E220 is a medium current ion implanter that was used for research and development purposes. It was first introduced in 1993 and has had minimal usage. The tool has undergone several updates, including a new monitor, rebuilt turbo, and replaced gas box.

E220

200mm high tilt and medium current applications for all chips.

Designs, manufactures and services ion implantation and other processing equipment used in the fabrication of semiconductor chips.

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

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E500-EHP

350D

E220

NV 8250HT