SEN CORPORATION / SUMITOMO NV-MC3 is a high-performance medium current ion implantation system that is suitable for 300 mm to 150 mm wafers. It is designed to achieve the highest implantation quality in the world, with an implantation energy range of 5 keV to 750 keV. The system minimizes metal and energy contamination, and reduces implantation angle deviation and beam shape change through the use of a left-right symmetric beam line. It also improves uniformity by reducing beam divergence and fixing the implant position with a unique scanning method. The NV-MC3 supports heavy ion implantation as standard, and is highly reliable and maintainable.

In 2000, Eaton spun off Axcelis as a separate company, and Axcelis inherited Eaton’s 50-percent ownership stake in the joint venture. SEN, licenses technology from Axcelis for ion implantation, has exclusive rights to the territory of Japan and is the leading producer of ion implantation equipment in Japan. In 2009, the merger between Axcelis Technologies and Sumitomo Heavy Industries dissolved—Sumitomo became the sole parent company, and with this, the company name changed to SEN Corporation. 

SEN CORPORATION / SUMITOMO

NV MC3

The SOPHI-200 is a compact ion implanter designed by ULVAC using their latest advanced technology. It is capable of running substrate sizes up to 200mm in diameter and comes in two energy ranges: up to 200KeV or up to 260KeV. This system is a powerful tool for ion implantation and is suitable for a wide range of applications.

ULVAC

SOPHI-200

The GSD/VHE is a high-energy implanter that is currently the most powerful in the industry. It has an extended energy range of up to 5MeV and features quad implant capability, superior cooling, and medium current performance. This makes it a reliable solution for both manufacturing and research and development applications. It is particularly well-suited for the creation of advanced integrated circuits that require deep twin or triple wells and buried layer structures. One of the key advantages of the GSD/VHE is its unmatched beam purity, which is achieved through the use of patented linear acceleration technology. This results in exceptional productivity and a low cost of ownership. The GSD/VHE is capable of performing 200mm very high energy implantation for logic, memory chips, and FLASH memory chips.

Designs, manufactures and services ion implantation and other processing equipment used in the fabrication of semiconductor chips.

AXCELIS

GSD VHE

November 10, 2011 – Applied Materials, Inc. announced the successful completion of its acquisition of Varian Semiconductor Equipment Associates, Inc. 
Varian is the leading supplier of ion implantation equipment used by chip makers and has been applying this technology to crystalline silicon wafers for photovoltaic panels. Varian will operate as a business unit of Applied's Silicon Systems Group.

Medium Current

概述

服务

Medium Current 的制造商

Medium Current 的热门产品

NV MC3

SOPHI-200

GSD VHE

E220-EHPi