Our flagship, the EUV-MBR is a stand alone tool for automated characterization of multilayers and absorbers
of EUV masks and mask blanks based on our well

RI develops and manufactures high-performance components, and systems, and provides solutions for scientific and industrial applications

RESEARCH INSTRUMENTS

EUV MBR

EUV mask and mask blank reflectometer (EUV-MBR)
Stand-alone EUV mask blank reflectometer

Distinctive EUV-MBR properties 
• Wavelength accuracy better than 2 pm
• Small Spot down to < 250 x 100 μm2
• 2000 spectral channels of 1.7 pm width.
• Less than 20 seconds exposure time for measuring full spectrum at small spot with full resolution
• Precision on CWL_50 < 1 pm
• Precision on reflectivity: < 0.1% abs.
• Accuracy on reflectivity: < 0.3 % abs.
• Resolution limit on absorbers: < 0.1 %
• Fiducial mark referenced positioning
• Direct quantification of scatter and flare.

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EUV MBR

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EUV MBR

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