说明
无说明配置
Model 2600 G3 HT Software Version CACE 3.5.0286 PLC 3.7 SLC 2.01 Process AlInGaP MOCVD Epitaxy Wafer Config & Size 7 x 6" Metal Organic Sources TMIn x 3, TMGa x 2, TMAl x 1, Cp2Mg x 1, DIPTe x 1, CBr4 x 1 Hydride Sources PH3 x 1, AsH3 x 1, 100 ppm SiH4 in Ar x 1 Concentration Monitors Epison5 x 3 for TMIn Chiller Baths ‐ Purifiers Entegris getter for H2 & N2 Filters Entegris filters for AsH3 & PH3 Heating System RF Coil with Trumpf Huttinger RF Generator BIG 120/50 Glove Box MBraun Nitrogen Glovebox with controller Exhaust System Custom Built Exhaust System Process Pump Kashiyama SDE300 DOR & Glove Box Pumps Adixen ACP ‐ 15G x 2 Spare Parts Potentially some available Aixtron 2600 G3 HT MOCVD Reactor Specifications 6” Abatement Custom Built Wet/Dry Burn Abatement System Reactor Chiller Affinity Recirculating Closed Loop Chiller Ceiling Quartz Ceiling with temperature control In‐Situ Pyrometry Laytec EpiTT with EpiNET 2.2 for feedback temperature control Gas Foil Rotation (GFR) Active Spare Channels Yes ‐ TBDOEM 型号描述
AIX 2600 G3, could accommodate 24 2-inch wafers.文件
无文件
类别
MOCVD
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
125706
晶圆尺寸：
未知
年份：
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AIXTRON
AIX 2600 G3 HT
类别
MOCVD
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
125706
晶圆尺寸：
未知
年份：
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Model 2600 G3 HT Software Version CACE 3.5.0286 PLC 3.7 SLC 2.01 Process AlInGaP MOCVD Epitaxy Wafer Config & Size 7 x 6" Metal Organic Sources TMIn x 3, TMGa x 2, TMAl x 1, Cp2Mg x 1, DIPTe x 1, CBr4 x 1 Hydride Sources PH3 x 1, AsH3 x 1, 100 ppm SiH4 in Ar x 1 Concentration Monitors Epison5 x 3 for TMIn Chiller Baths ‐ Purifiers Entegris getter for H2 & N2 Filters Entegris filters for AsH3 & PH3 Heating System RF Coil with Trumpf Huttinger RF Generator BIG 120/50 Glove Box MBraun Nitrogen Glovebox with controller Exhaust System Custom Built Exhaust System Process Pump Kashiyama SDE300 DOR & Glove Box Pumps Adixen ACP ‐ 15G x 2 Spare Parts Potentially some available Aixtron 2600 G3 HT MOCVD Reactor Specifications 6” Abatement Custom Built Wet/Dry Burn Abatement System Reactor Chiller Affinity Recirculating Closed Loop Chiller Ceiling Quartz Ceiling with temperature control In‐Situ Pyrometry Laytec EpiTT with EpiNET 2.2 for feedback temperature control Gas Foil Rotation (GFR) Active Spare Channels Yes ‐ TBDOEM 型号描述
AIX 2600 G3, could accommodate 24 2-inch wafers.文件
无文件