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AIXTRON AIX 2600 G3
  • AIXTRON AIX 2600 G3
  • AIXTRON AIX 2600 G3
说明
无说明
配置
Software Version CACE 3.5.0286 PLC 3.64+ SLC 2.01 Process AlInGaP MOCVD Epitaxy Wafer Config & Size 7 x 6" Metal Organic Sources TMIn x 3, TMGa x 2, TMAl x 1, Cp2Mg x 1, CBr4 x 1 Hydride Sources PH3 x 1, AsH3 x 1, 100 ppm SiH4 in Ar x 1 Concentration Monitors Epison5 x 3 for TMIn Chiller Baths 3 available for MO Sources Purifiers Entegris getter for H2 Filters ‐ Heating System RF Coil with Trumpf Huttinger RF Generator BIG 80/50 Glove Box MBraun Nitrogen Glovebox with controller Exhaust System Custom Built Exhaust System Process Pump Kashiyama SDE300 DOR & Glove Box Pumps Adixen ACP ‐ 15G x 2 Spare Parts Potentially some available Aixtron 2600 G3 MOCVD Reactor Specifications 6” Abatement Custom Built Wet/Dry Burn Abatement System Reactor Chiller Affinity Recirculating Closed Loop Chiller Ceiling Quartz Ceiling with temperature control In‐Situ Pyrometry Laytec EpiTT with EpiNET 2.2 for feedback temperature control Gas Foil Rotation (GFR) Active Spare Channels Yes ‐ TBD
OEM 型号描述
未提供
文件

无文件

类别
MOCVD

上次验证: 30 多天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

125709


晶圆尺寸:

6"/150mm


年份:

2000


Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

AIXTRON

AIX 2600 G3

verified-listing-icon
已验证
类别
MOCVD
上次验证: 30 多天前
listing-photo-4e41a5572d8340e491df702d8ecaca7b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73774/4e41a5572d8340e491df702d8ecaca7b/0c60866306384cf0b7ffba5f4708de70_d2fdaff3b2eb4a67ab26555f929ebc0b_mw.jpeg
listing-photo-4e41a5572d8340e491df702d8ecaca7b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73774/4e41a5572d8340e491df702d8ecaca7b/5af6663ef72d40d6992303624ad8f4e5_f780ef157b614e148f3ea51d432f4cf3_mw.jpeg
物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

125709


晶圆尺寸:

6"/150mm


年份:

2000


Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明
配置
Software Version CACE 3.5.0286 PLC 3.64+ SLC 2.01 Process AlInGaP MOCVD Epitaxy Wafer Config & Size 7 x 6" Metal Organic Sources TMIn x 3, TMGa x 2, TMAl x 1, Cp2Mg x 1, CBr4 x 1 Hydride Sources PH3 x 1, AsH3 x 1, 100 ppm SiH4 in Ar x 1 Concentration Monitors Epison5 x 3 for TMIn Chiller Baths 3 available for MO Sources Purifiers Entegris getter for H2 Filters ‐ Heating System RF Coil with Trumpf Huttinger RF Generator BIG 80/50 Glove Box MBraun Nitrogen Glovebox with controller Exhaust System Custom Built Exhaust System Process Pump Kashiyama SDE300 DOR & Glove Box Pumps Adixen ACP ‐ 15G x 2 Spare Parts Potentially some available Aixtron 2600 G3 MOCVD Reactor Specifications 6” Abatement Custom Built Wet/Dry Burn Abatement System Reactor Chiller Affinity Recirculating Closed Loop Chiller Ceiling Quartz Ceiling with temperature control In‐Situ Pyrometry Laytec EpiTT with EpiNET 2.2 for feedback temperature control Gas Foil Rotation (GFR) Active Spare Channels Yes ‐ TBD
OEM 型号描述
未提供
文件

无文件