说明
无说明配置
Software Version CACE 3.5.0286 PLC 3.65+ SLC 2.01 Process AlInGaP MOCVD Epitaxy Wafer Config & Size 12 x 3" Metal Organic Sources TMIn x 3, TMGa x 2, TMAl x 1, Cp2Mg x 1, DIPTe x 1 Hydride Sources PH3 x 2, AsH3 x 1, 100 ppm SiH4 in Ar x 1 Concentration Monitors Epison2 x 3 for TMIn, Epison2 x 1 for DIPTe Chiller Baths 4 available for MO Sources Purifiers Entegris getter for H2 Filters ‐ Heating System RF Coil with Trumpf Huttinger RF Generator BIG 80/50 Glove Box MBraun Nitrogen Glovebox with controller Exhaust System Custom Built Exhaust System Process Pump Kashiyama SD90V3 DOR & Glove Box Pumps Adixen ACP ‐ 15G x 2 Spare Parts Potentially some available Aixtron 2600 G3 MOCVD Reactor Specifications 3” Abatement Custom Built Wet/Dry Burn Abatement System Reactor Chiller Affinity Recirculating Closed Loop Chiller Ceiling Quartz Ceiling with temperature control In‐Situ Pyrometry ‐ Gas Foil Rotation (GFR) Active Spare Channels Yes ‐ TBDOEM 型号描述
未提供文件
无文件
类别
MOCVD
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
125708
晶圆尺寸：
3"/75mm
年份：
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
查看全部
AIXTRON
AIX 2600 G3
类别
MOCVD
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
125708
晶圆尺寸：
3"/75mm
年份：
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Software Version CACE 3.5.0286 PLC 3.65+ SLC 2.01 Process AlInGaP MOCVD Epitaxy Wafer Config & Size 12 x 3" Metal Organic Sources TMIn x 3, TMGa x 2, TMAl x 1, Cp2Mg x 1, DIPTe x 1 Hydride Sources PH3 x 2, AsH3 x 1, 100 ppm SiH4 in Ar x 1 Concentration Monitors Epison2 x 3 for TMIn, Epison2 x 1 for DIPTe Chiller Baths 4 available for MO Sources Purifiers Entegris getter for H2 Filters ‐ Heating System RF Coil with Trumpf Huttinger RF Generator BIG 80/50 Glove Box MBraun Nitrogen Glovebox with controller Exhaust System Custom Built Exhaust System Process Pump Kashiyama SD90V3 DOR & Glove Box Pumps Adixen ACP ‐ 15G x 2 Spare Parts Potentially some available Aixtron 2600 G3 MOCVD Reactor Specifications 3” Abatement Custom Built Wet/Dry Burn Abatement System Reactor Chiller Affinity Recirculating Closed Loop Chiller Ceiling Quartz Ceiling with temperature control In‐Situ Pyrometry ‐ Gas Foil Rotation (GFR) Active Spare Channels Yes ‐ TBDOEM 型号描述
未提供文件
无文件