概述

The AIXTRON G4 is a series of cutting-edge metal-organic chemical vapor deposition (MOCVD) systems developed by AIXTRON SE, a leading provider of deposition equipment in the semiconductor industry. As the latest generation in the AIXTRON MOCVD systems, the G4 series introduces advanced features and capabilities for epitaxial growth of compound semiconductor materials. This state-of-the-art series is designed to deliver precise and controlled growth processes, making it a crucial tool for manufacturing a wide range of semiconductor devices, including optoelectronic components like LEDs, laser diodes, and high-power transistors, contributing to advancements in various electronic applications.