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LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" SEQUEL
    说明
    无说明
    配置
    Tool is currently still in production. Tool is in good condition. Inspect to confirm configuration and condition. <b>C2 Single Sequel Shrink</b> Electrical Requirements : 208 VAC, 3 phase, 5-wire Wafer Size (inches) : 8  Wafer Type : Notch Stand Alone Install Type Software Version : C2 sequel 4.94 B15 RF Generator Rack  SSD  Serial Number: DLCM : C2-DLCM-S0309              Module A : C2-CVDD-S 4854        <b>DLCM</b> Signal Lamp Tower   IOC Version : 4.2 Integrated SMIF     Model : Asyst SMIF, LPT 2200 VTR 5 Robot SECS / GEMS  <b>Sequel Chamber</b> Process Type : STD Nitride Digital Dynamics IOC  Heated Valves  Gate Valve Mfg &amp; Model : Gate Valve Assy, Heated 4 Inch. Novellus RF Match Type : A.E. End Point Detector  RF Generators      Advanced Energy        RFG5500      Advanced Energy        PDX1400 <b>Pumps</b> Deposition Chamber Pump: Alcatel ADS 1202P Load Lock Pump: Alcatel A100L Transfer Chamber Pump: Alcatel A100L <b>Gas Box Configuration  </b>   Gas Line #    Gas                 Flow (sccm)        MFC Mfgr.       MFC Model 1                    SiH4               750                      Horiba             Z512 2                    N2                  5000                    Unit                 UFC1661 3                    2ND SiH4       350                      Horiba             Z512 4                    He                  10000                   Unit                 UFC1661 5                    NH3               10000                   Unit                  UFC1661 6                    He (Aux)        1000                     Unit                  UFC1661 7                    NF3                5000                    Unit                  UFC1661 8                    N2O                20000                 Unit                   UFC1661 9                    N2                  12000                  Unit                   UFC1661 10                  CO2                20000                 Unit                   UFC1661
    OEM 型号描述
    The NOVELLUS CONCEPT TWO SEQUEL is a Reactors / MOCVD system that can produce wafer size of 8 inches. It was initially shipped in a single chamber version targeted at thin dielectric films used in volume 200mm IMD production applications.
    文件

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    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" SEQUEL

    verified-listing-icon

    已验证

    类别

    MOCVD
    上次验证: 60 多天前
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    13438


    晶圆尺寸:

    8"/200mm


    年份:

    1998

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    LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" SEQUEL
    LAM RESEARCH / NOVELLUSCONCEPT TWO "C2" SEQUELMOCVD
    年份: 0状况: 二手
    上次验证30 多天前

    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" SEQUEL

    verified-listing-icon

    已验证

    类别

    MOCVD
    上次验证: 60 多天前
    listing-photo-6OR4nFPHetNh4O2GBKEv741YPKPQebf7fnJKr1I1GmQ-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    13438


    晶圆尺寸:

    8"/200mm


    年份:

    1998


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    Tool is currently still in production. Tool is in good condition. Inspect to confirm configuration and condition. <b>C2 Single Sequel Shrink</b> Electrical Requirements : 208 VAC, 3 phase, 5-wire Wafer Size (inches) : 8  Wafer Type : Notch Stand Alone Install Type Software Version : C2 sequel 4.94 B15 RF Generator Rack  SSD  Serial Number: DLCM : C2-DLCM-S0309              Module A : C2-CVDD-S 4854        <b>DLCM</b> Signal Lamp Tower   IOC Version : 4.2 Integrated SMIF     Model : Asyst SMIF, LPT 2200 VTR 5 Robot SECS / GEMS  <b>Sequel Chamber</b> Process Type : STD Nitride Digital Dynamics IOC  Heated Valves  Gate Valve Mfg &amp; Model : Gate Valve Assy, Heated 4 Inch. Novellus RF Match Type : A.E. End Point Detector  RF Generators      Advanced Energy        RFG5500      Advanced Energy        PDX1400 <b>Pumps</b> Deposition Chamber Pump: Alcatel ADS 1202P Load Lock Pump: Alcatel A100L Transfer Chamber Pump: Alcatel A100L <b>Gas Box Configuration  </b>   Gas Line #    Gas                 Flow (sccm)        MFC Mfgr.       MFC Model 1                    SiH4               750                      Horiba             Z512 2                    N2                  5000                    Unit                 UFC1661 3                    2ND SiH4       350                      Horiba             Z512 4                    He                  10000                   Unit                 UFC1661 5                    NH3               10000                   Unit                  UFC1661 6                    He (Aux)        1000                     Unit                  UFC1661 7                    NF3                5000                    Unit                  UFC1661 8                    N2O                20000                 Unit                   UFC1661 9                    N2                  12000                  Unit                   UFC1661 10                  CO2                20000                 Unit                   UFC1661
    OEM 型号描述
    The NOVELLUS CONCEPT TWO SEQUEL is a Reactors / MOCVD system that can produce wafer size of 8 inches. It was initially shipped in a single chamber version targeted at thin dielectric films used in volume 200mm IMD production applications.
    文件

    无文件

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    查看全部
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