Semiconductors control a host of functions in electronic equipment. Nikon offers a stellar lineup of cutting-edge lithography systems that support precision circuit design down to the nanometer level.

NIKON

NRM-3100

The Archer 200 is an optical overlay control system designed to meet the performance and cost-of-ownership requirements for advanced design rules, including 32nm and double-patterning lithography. It features major improvements to its core optical design and an optional scatterometry measurement technology. This system offers tighter total measurement uncertainty, increased flexibility, higher productivity, and faster measurement. It uses industry-standard AIM or smaller µAIM targets.

KLA inhabits two worlds: one that’s nanometers in scale and one that’s global. This micro and macro view gives us a unique perspective. We see electrons wave and industries transform. When you put deep science together with optimism, big things happen.

Our process-control and process-enabling solutions are designed to boost the innovation speed of the electronics industry. We help our customers achieve leading-edge performance.

ARCHER 200

The KLA-Tencor 5200XP is an automated overlay metrology tool for the semiconductor industry. It improves overlay control, maximizes lithography tool utilization, and meets the requirements of 0.18 µm design rules. It has the highest throughput in the industry and is compatible with current factory automation standards.

5200XP

The Archer 300 LCM is a high-performance, low-cost metrology system for 2Xnm logic and 1Xnm half-pitch memory devices. It offers precision, fast measurement speed, and in-field metrology capability. Improvements to the imaging-based optical subsystem result in better overlay measurement specifications than the previous-generation Archer 200. The system provides cost-effective characterization of overlay error and CD on lithography process layers for double patterning and other advanced technologies. It is also seamlessly integrated with K-T Analyzer, an advanced data analysis system, and Recipe Database Manager (RDM), a centralized database of production-proven recipe components. The Archer 300 LCM is suitable for double patterning technologies, scanner qualification, and in-line monitoring.

Overlay

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Overlay 的热门产品

NRM-3100

ARCHER 200

5200XP

ARCHER 300