说明
Oxford Plasmalab 100 RIE System 208V, 50/60Hz, w/ VAT PM-5 adaptive pressure controller, Adixen ACT 1300M turbopump controller Thermo Neslab RTE7 chiller, BOM#271103200200; Leybold D65BCS vacuum pump w/ oil filter & exhaust filter; OptiTemp OTI-5WL-P3-216 chiller; gas box; control computer. LCD monitor.配置
无配置OEM 型号描述
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces文件
无文件
类别
PECVD
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
135813
晶圆尺寸：
6"/150mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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OXFORD
PLASMALAB 100
类别
PECVD
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
135813
晶圆尺寸：
6"/150mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Oxford Plasmalab 100 RIE System 208V, 50/60Hz, w/ VAT PM-5 adaptive pressure controller, Adixen ACT 1300M turbopump controller Thermo Neslab RTE7 chiller, BOM#271103200200; Leybold D65BCS vacuum pump w/ oil filter & exhaust filter; OptiTemp OTI-5WL-P3-216 chiller; gas box; control computer. LCD monitor.配置
无配置OEM 型号描述
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces文件
无文件