说明
Used. Just taken offline in 2021/07 and not able to run the equipment now. If there are any questions or you need more info, please contact us.配置
1. Chamber: Aluminum, 600(ID) x 138(H)mm, chamber lid opening/closing by manual 2. Electrode: Parallel plate, cathode coupling electrodes 3. Substrate Heating: Resistive heater, Max. 400℃, PID controlled 4. Substrate Holder: 5 x Φ6", Aluminum carrier. (or 13 x 4" wafer) 5. RF Power: AE Cesar, 13.56MHz, Max. 1,000W, all solid state. 6. Gas Inlet Lines: 2 Mass Flow Controllers with metal sealed and bypass lines for 10%-(SiH4 / N2) and NH3. 4 Mass Flow Controllers for N2O, N2, CF4 and O2.OEM 型号描述
未提供文件
无文件
CELLO
AEGIS-60
已验证
类别
Photolithography
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
47750
晶圆尺寸：
未知
年份：
2014
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
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CELLO
AEGIS-60
已验证
类别
Photolithography
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
47750
晶圆尺寸：
未知
年份：
2014
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Used. Just taken offline in 2021/07 and not able to run the equipment now. If there are any questions or you need more info, please contact us.配置
1. Chamber: Aluminum, 600(ID) x 138(H)mm, chamber lid opening/closing by manual 2. Electrode: Parallel plate, cathode coupling electrodes 3. Substrate Heating: Resistive heater, Max. 400℃, PID controlled 4. Substrate Holder: 5 x Φ6", Aluminum carrier. (or 13 x 4" wafer) 5. RF Power: AE Cesar, 13.56MHz, Max. 1,000W, all solid state. 6. Gas Inlet Lines: 2 Mass Flow Controllers with metal sealed and bypass lines for 10%-(SiH4 / N2) and NH3. 4 Mass Flow Controllers for N2O, N2, CF4 and O2.OEM 型号描述
未提供文件
无文件
类似上架物品
查看全部无类似上架物品