ZEISS MeRiT neXT tool is the industry standard for high-end photomask repairs. By using ZEISS electron beam column, it enables the repair of smallest defects on many different types of photomasks. Clear and opaque defects can be repaired based on exposure with focused electron beams and adsorption of precursor molecules. It features a minimum repair size of 15nm. MeRiT® neXT systems are currently employed in mask shops all over the world to repair all kinds of standard DUV and EUV photomasks down to 7nm technology node.

ZEISS is the global technology leader in the production of systems and modules for microchip production. With semiconductor manufacturing optics, photomask systems and process control solutions, ZEISS supplies key technologies for the production of ultra-fine conductor track structures on silicon wafers – the raw material used to make microchips. Advances in computer technology largely rely on the ongoing development of optical lithography – every new generation enables even finer structures to be produced on the microchips. This makes circuits more compact, resulting in more powerful and more energy-efficient microchips every year. ZEISS has been driving the development of semiconductor manufacturing technology right from day one. ZEISS’ new and unique extreme ultraviolet (EUV) lithography has created a series of further generations of microchips with ever greater integration density and performance.

MeRiT neXT

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