概述

The GHW12 13.56 MHz, 1.25 kW, RF Plasma Generator is ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications. GHW Series RF Plasma Generators are available at 208 VAC and 400/480 VAC. GHW RF plasma generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices. All MKS Instruments' RF Generators are NRTL certified and CE marked.