说明
Temperature Monitoring配置
无配置OEM 型号描述
The Process Probe™ 1530 and 1535 instrumented wafers are used to monitor in situ temperatures for a wide range of processes, including cold wall, RTP, sputtering, CVD, plasma strippers and epitaxial reactors. The Process Probe 1530 and 1535 provide direct, real-time measurement of wafer temperature during each critical step of the process cycle. With this comprehensive temperature data, process engineers can characterize and fine tune process conditions, driving improved process equipment performance, wafer quality and yield. Process development, Process qualification, Process tool qualification, Process tool matching Cold wall thin film process chambers (1530), Hot wall thin film process chambers (1535) | 0-1100°C文件
无文件
KLA
1530
已验证
类别
Probers
上次验证： 8 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
91949
晶圆尺寸：
8"/200mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA
1530
类别
Probers
上次验证： 8 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
91949
晶圆尺寸：
8"/200mm
年份：
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Temperature Monitoring配置
无配置OEM 型号描述
The Process Probe™ 1530 and 1535 instrumented wafers are used to monitor in situ temperatures for a wide range of processes, including cold wall, RTP, sputtering, CVD, plasma strippers and epitaxial reactors. The Process Probe 1530 and 1535 provide direct, real-time measurement of wafer temperature during each critical step of the process cycle. With this comprehensive temperature data, process engineers can characterize and fine tune process conditions, driving improved process equipment performance, wafer quality and yield. Process development, Process qualification, Process tool qualification, Process tool matching Cold wall thin film process chambers (1530), Hot wall thin film process chambers (1535) | 0-1100°C文件
无文件