The ASM Epsilon One is a single-wafer, lamp-heated, RTCVD (Rapid Thermal Chemical Vapor Deposition) reactor. The temperature distribution for an ASM Epsilon One CVD reactor has been simulated by commercial fluent software with the total pressure at ATM. To simplify the simulation, hydrogen is considered to be the main gas flowing over the susceptor. Additionally, Epsilon One features the industry’s highest deposition rates at low temperatures due to its optimized performance with ASM’s Silcore® precursors.

ASM is a supplier of semiconductor process equipment for wafer processing, including lithography, deposition, ion implant and single-wafer epitaxy. ASM is part of the ASM International NV group that also includes ASM Pacific Technology (ASMPT). ASMPT, in which ASMI holds a substantial ownership is a leading supplier of semiconductor process equipment for wafer assembly and packaging, and for surface mount technology.



EPSILON ONE

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