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HELIOS 800
概述
Technology: Plasma-assisted reactive magnetron -sputtering (PARMS/ PARMS+) Applications: MF sputtering (optional: RF, DC sputtering) MF sputtering Coating material: SiO2, Al2O3, Nb2O5, Ta2O5, HfO2, ZrO2, HfO2, Si3N4, ITO, Al, Ag, SiH Capacity: 12* pcs. at Ø 200 mm / 8”
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