概述

Endeavor AT – an exceptional single-wafer processing solution designed in a cluster style and operating within a high-vacuum environment. The innovative S-Gun sputter source design, protected by a patent, empowers operators with meticulous command over process variables, while also granting the freedom to forge novel processes. Crafted with an unwavering commitment to superior outcomes, streamlined design, user-friendly maintenance, and unwavering dependability, each system exemplifies a dedication to excellence.