This reactor is equipped for As/P material deposition. I think the previous user used it for GaAs deposition.

Electrically it was performing OK, but now the front panel was turned off. We expect this to need a small fix, maybe something was unplugged, but the hardware should be OK.

Lid cannot be opened now because we took the closed position sensors from the lid.

Load lock can pump down but not backfill, probably a small issue.

The AIXTRON Group provides deposition equipment to the semiconductor industry. They are used for a wide range of manufacturing high-performance components for electronic and optoelectronic applications based on compound or organic semiconductor materials. These components are used in a variety of innovative applications, technologies and industries. These include, for example, LED and display technology, data transmission, sensor technology, energy management and conversion, communication, signal and lighting technology, and many other sophisticated high-tech applications.

AIXTRON

The AIXTRON G3 is a commercial MOCVD (Metal-Organic Chemical Vapor Deposition) system featuring a planetary cold-wall reactor design. This system exhibits an abrupt temperature gradient near the substrate, with the highest temperature at the substrate and a rapid decrease along the surface normal direction. This controlled temperature profile ensures precise and efficient epitaxial growth of compound semiconductor materials, making it suitable for various applications, including the production of optoelectronic devices like LEDs and laser diodes.

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AIXTRON

G3

MOCVD

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G3

MOCVD

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