概述

The Prismo HiT3® system is engineered to mass produce deep UV LEDs with excellent process performance. It enables the growth of high-quality aluminum nitride and high-aluminum component materials. With a maximum reactor chamber temperature of 1400 Celsius degrees, the system can process up to 18 2-inch epitaxial wafers per run, with extendibility to 4-inch wafers, making it one of the highest throughput advanced tool of its kind in the industry.