跳至主要内容
6" Fab For Sale from Moov - Click Here to Learn More
6" Fab For Sale from Moov - Click Here to Learn More
Moov logo

6" Fab For Sale from Moov - Click Here to Learn More
Moov Icon
市场 > PECVD > ULVAC > CC-200

CC-200

类别
PECVD
概述

The CC-200 is a compact and easy-to-use load-lock type Plasma-CVD system for R&D use and production. It features a high-density plasma process on 27.12MHz and supports the deposition of SiH4 (SiO2, SiNx, SiON, a-Si) and TEOS (SiO2). The system also supports chamber cleaning by CF4+O2 plasma, a heater for low-temperature deposition of organic EL, and various substrate sizes. The CC-200 is capable of vacuum box-enabled indirect sequential processing within the C-series (Sputter: CS-200, Evaporation: CV-200). It has applications in power devices, compound-related devices of LED, LD and high-speed devices, organic EL systems for R&D use, solar battery systems for R&D use, and MEMS.

活动的上架物品

0

服务

检验、保险、评估、物流

热门上架物品

    未找到产品
有类似物品吗?
使用 Moov 上架,立即找到完美买家。