概述

The Applied Aera 4 Mask Inspection system is a fourth-generation 193nm-based inspection tool unique in combining true aerial imaging with cutting-edge high-resolution imaging. Equipped with a new lithography-grade lens, the Aera 4 system demonstrates improved signal-to-noise for both standard high-resolution applications and aerial inspection, making it the tool of choice for 1x nm technology nodes and for early-production EUV mask inspection. The system performs highly sensitive mask inspection, as required for double- and quadruple-patterning lithography technologies, while maintaining a very low false alarm rate.