概述

The Therma-Probe® 680XP ion implant/anneal metrology system enables inline dose monitoring for the 2Xnm/1Xnm design nodes. The Therma-Probe 680XP produces critical process information about ion implant dose and profile, implant and anneal uniformity and end of range damage. In addition, the Therma-Probe 680XP system’s high resolution micro uniformity maps provide fingerprinting capability for implant and anneal process development.