说明
无说明配置
Tool Status: In production. Configuration attached in a separate document. Audit to verify <b>Additional Information:</b><span style="font-family: Symbol;">·</span><span style="font-size: 7pt;"> </span>The hard drive will be removed. The system will come with no operating software.OEM 型号描述
The 2300 Versys Kiyo is a manufacturing tool designed for 65 nm and beyond. It provides excellent uniformity and defect control on a reliable wafer transport system. The symmetric chamber and radial tuning features produce uniform etch results for advanced devices. It employs proprietary technology for process repeatability, low defect, and metal contamination results. It supports conventional applications such as gate and shallow trench isolation (STI) and emerging applications such as high k dielectric removal, critical spacer etch, and lithography-enabling etch steps. The system can be upgraded from the 2300 Versys Star, providing an investment-extending strategy.文件
无文件
LAM RESEARCH CORPORATION
2300 VERSYS KIYO
已验证
类别
RIE
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
17085
晶圆尺寸：
12"/300mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH CORPORATION
2300 VERSYS KIYO
已验证
类别
RIE
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
17085
晶圆尺寸：
12"/300mm
年份：
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Tool Status: In production. Configuration attached in a separate document. Audit to verify <b>Additional Information:</b><span style="font-family: Symbol;">·</span><span style="font-size: 7pt;"> </span>The hard drive will be removed. The system will come with no operating software.OEM 型号描述
The 2300 Versys Kiyo is a manufacturing tool designed for 65 nm and beyond. It provides excellent uniformity and defect control on a reliable wafer transport system. The symmetric chamber and radial tuning features produce uniform etch results for advanced devices. It employs proprietary technology for process repeatability, low defect, and metal contamination results. It supports conventional applications such as gate and shallow trench isolation (STI) and emerging applications such as high k dielectric removal, critical spacer etch, and lithography-enabling etch steps. The system can be upgraded from the 2300 Versys Star, providing an investment-extending strategy.文件
无文件