Apex SLR: ICP-Etch
-Ideal for small volume production and R&D. Small footprint design
-Load lock method, manual load specification
-Adopts 2MHz ICP source. Improved etching rate and uniformity with high-density plasma
-ICP source section can be opened and closed 90 degrees for easy access to the lower electrode, and equipped with a slide mechanism for easy turbo pump replacement.
-Independent control of plasma density and bias possible
-Compatible with chlorine-based etching applications
-Compatible with various end point detection methods

Plasma-Therm is a global manufacturer of plasma etch, deposition, and advanced packaging equipment for the specialty semiconductor and nanotechnology markets.

APEX SLR

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