CENTURA DPN
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RTP/RTA概述
The AMAT CENTURA METAL DPS is a system that was introduced in 1996 for HDP etching of metal and silicon films. It uses AMAT’s DPS (Decoupled Plasma Source) technology. The DPS Metal Etch Centura and DPS Silicon Etch Centura are designed for advanced applications, primarily for deep submicron devices (0.25-micron).
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