说明
WAFER SCRUBBER配置
WETOEM 型号描述
The SS-4 is a stand-alone wafer scrubber system developed by TEL. It is based on the Clean Track Mark 7 photoresist processing system and utilizes the Mark 7’s non-vacuum wafer handling capability. With TEL’s unique brushes and mechanical chuck, the SS-4 is capable of cleaning both sides of the wafer on a carrier-to-carrier basis, contributing remarkably to enhancing the megabit process yield. The SS-4 also offers the option to expand the variety of cleaning processes by combining the brush with a jet or Megasonic cleaning dispenser. Additionally, the SS-4 features TEL’s newest cleaning head, the hydraulic membrane head, which can be used with patterned, hydrophobic surfaces and even soft metal layers, expanding the applications for which scrubbers can be used.文件
无文件
TEL / TOKYO ELECTRON
SS4
已验证
类别
Wafer Scrubber
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
45962
晶圆尺寸：
8"/200mm
年份：
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
SS4
已验证
类别
Wafer Scrubber
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
45962
晶圆尺寸：
8"/200mm
年份：
2003
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
WAFER SCRUBBER配置
WETOEM 型号描述
The SS-4 is a stand-alone wafer scrubber system developed by TEL. It is based on the Clean Track Mark 7 photoresist processing system and utilizes the Mark 7’s non-vacuum wafer handling capability. With TEL’s unique brushes and mechanical chuck, the SS-4 is capable of cleaning both sides of the wafer on a carrier-to-carrier basis, contributing remarkably to enhancing the megabit process yield. The SS-4 also offers the option to expand the variety of cleaning processes by combining the brush with a jet or Megasonic cleaning dispenser. Additionally, the SS-4 features TEL’s newest cleaning head, the hydraulic membrane head, which can be used with patterned, hydrophobic surfaces and even soft metal layers, expanding the applications for which scrubbers can be used.文件
无文件