The EVO 25 chamber is tailor-made for automotive and aerospace or steel and metals applications that use the largest specimens. The chamber accommodates samples up to a maximum specimen diameter of 300 mm and a maximum height of 210 mm. Expand EVO 25 capabilities further with an optional 80 mm Z travel stage that can handle weights up to 2 kg including tilt.

ZEISS is the global technology leader in the production of systems and modules for microchip production. With semiconductor manufacturing optics, photomask systems and process control solutions, ZEISS supplies key technologies for the production of ultra-fine conductor track structures on silicon wafers – the raw material used to make microchips. Advances in computer technology largely rely on the ongoing development of optical lithography – every new generation enables even finer structures to be produced on the microchips. This makes circuits more compact, resulting in more powerful and more energy-efficient microchips every year. ZEISS has been driving the development of semiconductor manufacturing technology right from day one. ZEISS’ new and unique extreme ultraviolet (EUV) lithography has created a series of further generations of microchips with ever greater integration density and performance.

EVO 25

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