说明
METRO配置
METROOEM 型号描述
The S-4700 Type I is a cutting-edge electron microscope with remarkable features. It offers high-resolution imaging at low accelerating voltages, ensuring a guaranteed resolution of 2.1 nm at 1 kV. Routine microscopy is made convenient with a long working distance of 12 mm, allowing sample exchange via an airlock without the need for repositioning. At 15 kV, the microscope maintains a high resolution of 1.5 nm. Additionally, it enables a sample tilt of 45 degrees without altering the working distance and offers a high X-ray take-off angle of 30 degrees with the sample normal to the beam. The instrument boasts an integrated electron detector for both secondary electrons (SE) and backscattered electrons (BSE), allowing operators to choose the best imaging mode for their samples. With complete column setup controlled through a computer interface, users can effortlessly switch between ultra-high-resolution mode and analysis mode. The unique objective lens design permits simultaneous use of YAG-type BSE and EDX detectors, enhancing imaging versatility.文件
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HITACHI
S-4700 I
已验证
类别
SEM
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
47259
晶圆尺寸：
6"/150mm
年份：
1998
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Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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HITACHI
S-4700 I
已验证
类别
SEM
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
47259
晶圆尺寸：
6"/150mm
年份：
1998
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
METRO配置
METROOEM 型号描述
The S-4700 Type I is a cutting-edge electron microscope with remarkable features. It offers high-resolution imaging at low accelerating voltages, ensuring a guaranteed resolution of 2.1 nm at 1 kV. Routine microscopy is made convenient with a long working distance of 12 mm, allowing sample exchange via an airlock without the need for repositioning. At 15 kV, the microscope maintains a high resolution of 1.5 nm. Additionally, it enables a sample tilt of 45 degrees without altering the working distance and offers a high X-ray take-off angle of 30 degrees with the sample normal to the beam. The instrument boasts an integrated electron detector for both secondary electrons (SE) and backscattered electrons (BSE), allowing operators to choose the best imaging mode for their samples. With complete column setup controlled through a computer interface, users can effortlessly switch between ultra-high-resolution mode and analysis mode. The unique objective lens design permits simultaneous use of YAG-type BSE and EDX detectors, enhancing imaging versatility.文件
无文件