概述

The ZETA™ 200 is a fully automated system that can transfer wafer batches from incoming SMIF pods to the process chamber in a full mini-environment, ensuring minimal added particles. The system features the unique, high-temperature ViPR™ process for high-performance and low-cost stripping of resist, silicide, and other films. Batch spray processing provides a more economical alternative to single wafer resist strip solutions. The ZETA™ 200 can be configured with up to 8 different chemical inputs to a single, closed chamber, providing the flexibility to blend chemicals or change mix ratios and temperatures within a recipe. This system is also available in 300mm as the ZETA™ 300.