说明
PVD / Sputter Missing Part: HDD配置
FI:5.3 FI Robot: KAWASAKI FIS: 0190-22269 FES: 0190-17956 Buffer & Xfer Robot: XP Robot Ch-1: NA Ch-2: Ti, DC Power Supply: ENI DCG-200E OPTIMA Ch-3: TiN DC Power Supply: ENI DCG-200E OPTIMA Ch-4: TiN DC Power Supply: ENI DCG-200E OPTIMA Ch-5: NA Ch-A: Pass Ch-B: Cool Ch-C: PC-XT RF Generator: COMDEL CDX-2000 Ch-D: PC-XT RF Generator: COMDEL CDX-2000 Ch-E: Degas (Single Heat) Ch-F: Degas (Single Heat) Cryo Compressor: CTI IS-1000 x2setOEM 型号描述
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.文件
无文件
APPLIED MATERIALS (AMAT)
ENDURA II
已验证
类别
PVD / Sputtering
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
44740
晶圆尺寸:
12"/300mm
年份:
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
查看全部APPLIED MATERIALS (AMAT)
ENDURA II
已验证
类别
PVD / Sputtering
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
44740
晶圆尺寸:
12"/300mm
年份:
2006
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
PVD / Sputter Missing Part: HDD配置
FI:5.3 FI Robot: KAWASAKI FIS: 0190-22269 FES: 0190-17956 Buffer & Xfer Robot: XP Robot Ch-1: NA Ch-2: Ti, DC Power Supply: ENI DCG-200E OPTIMA Ch-3: TiN DC Power Supply: ENI DCG-200E OPTIMA Ch-4: TiN DC Power Supply: ENI DCG-200E OPTIMA Ch-5: NA Ch-A: Pass Ch-B: Cool Ch-C: PC-XT RF Generator: COMDEL CDX-2000 Ch-D: PC-XT RF Generator: COMDEL CDX-2000 Ch-E: Degas (Single Heat) Ch-F: Degas (Single Heat) Cryo Compressor: CTI IS-1000 x2setOEM 型号描述
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.文件
无文件