概述

The Spin Rinser/Dryer (SRD) is a tool that provides a high-speed rinse and dry of wafers. It is designed to achieve low particle counts and reduced DI water consumption, making it an efficient and effective tool for wafer processing. The SRD is 300mm ready, meaning it can accommodate wafers of that size. It also has the option for rinse dry or dry only, allowing for flexibility in its use.